文献类型：期刊文献

中文题名：四氟化硅气体中杂质的检测及净化研究进展

英文题名：Progress in detection and purification of impurities in silicon tetrafluoride gas

作者：张丹辉 唐安江 韦德举 黄崇

第一作者：张丹辉

机构：[1]贵州大学化学与化工学院,贵州贵阳550025;[2]贵州理工学院化学工程学院,贵州贵阳550003

第一机构：贵州大学化学与化工学院,贵州贵阳550025

年份：2019

卷号：48

期号：2

起止页码：486-489

中文期刊名：应用化工

外文期刊名：Applied Chemical Industry

收录：CSTPCD;;北大核心:【北大核心2017】；CSCD:【CSCD_E2019_2020】；

基金：贵州省科技计划项目(黔科合SY字[2014]3058)

语种：中文

中文关键词：四氟化硅;杂质检测;杂质净化

外文关键词：silicon tetrafluoride;impurity detection;impurity purification

摘要：介绍了四氟化硅气体中杂质的4种检测方法:气相色谱法、红外光谱法、气相色谱质谱法、原子发射光谱法。其中,气相色谱法一般用来测定四氟化硅气体中的烃类杂质,红外光谱法主要用来测定四氟化硅气体中的氟硅烷、氟氧硅烷、氟硅醇杂质。气相色谱质谱法用来测定四氟化硅气体中的六氟化硫杂质,原子发射光谱法主要用来测定四氟化硅气体中的金属杂质。然后对四氟化硅气体的不同净化方法进行列举,并对净化工艺的条件、优缺点进行了阐述。
The four detection methods for impurities in silicon tetrafluoride gas were introduced:gas chromatography,infrared spectroscopy,gas chromatography mass spectrometry,and atomic emission spectrometry.Among them,gas chromatography is generally used to determine hydrocarbon impurities in silicon tetrafluoride gas,and infrared spectroscopy is mainly used to determine fluorine silane,fluorooxysilane,and fluorosilicone impurities in silicon tetrafluoride gas.Gas chromatography-mass spectrometry was used to determine sulfur hexafluoride impurities in silicon tetrafluoride gas.Atomic emission spectrometry was mainly used to determine metal impurities in silicon tetrafluoride gas.Then the different purification methods for silicon tetrafluoride gas are listed,and the conditions,advantages and disadvantages of the purification process are described.